Название: Chemical Vapour Deposition: Growth Processes on an Atomic Level
Автор:Larsson K.
Издательство:IOP Publishing Ltd
Год:2022
Формат:PDF
Страниц:415
Размер: 15,1 МБ
Язык: English

Chemical vapour deposition (CVD) is a vacuum deposition method used to produce high-quality, high-performance, solid materials. This is the first book to cover CVD growth processes at the atomic level using a combination of theoretical and experimental tools, including density functional theory (DFT) calculations. By demonstrating the methodology behind the modelling and simulation of CVD growth processes, the text provides guidance and practical advice on how to acquire successful theoretical results.
Worked examples, case studies, end-of-chapter summaries and animations of atomic-level surface processes are included to aid learning. After reading this text, researchers and students will have the knowledge they need to tailor-make desired growth processes for the deposition of materials with specific properties.